Contribution of EUV resist counting statistics to stochastic printing failures
- William D. Hinsberg
- Gregory M. Wallraff
- et al.
- 2021
- JM3
Paper
Publications
66 results for Martha I. Sanchez
An analysis of EUV resist stochastic printing failures
- Martha I. Sanchez
- Gregory M. Wallraff
- et al.
- 2019
- EUVL 2019
Conference paperDSA patterning options for logics and memory applications
- Chi Chun Liu
- Elliott Franke
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperElectrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle
- Cheng Chi
- Chi Chun Liu
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperStrategies to enable directed self-Assembly contact hole shrink for tight pitches
- Kristin Schmidt
- Hitoshi Osaki
- et al.
- 2016
- SPIE Advanced Lithography 2016
Conference paperDSA via hole shrink for advanced node applications
- Cheng Chi
- Chi Chun Liu
- et al.
- 2016
- SPIE Advanced Lithography 2016
Conference paperICE: Ionic contrast enhancement for organic solvent negative tone develop
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2014
- SPIE Advanced Lithography 2014
Conference paperDefects on high resolution negative-tone resist The revenge of the blobs
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Photomask Technology + EUV Lithography 2013
Conference paperMonitoring the evolution of Line Edge Roughness during resist development using an analog of quenched flow kinetics
- M.I. Sanchez
- L.K. Sundberg
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperFundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
- Ramakrishnan Ayothi
- Lovejeet Singh
- et al.
- 2012
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Paper