Growth and scaling of oxide conduction after breakdown
- Barry P. Linder
- James H. Stathis
- et al.
- 2003
- IRPS 2003
Conference paper
Publications
109 results for David J. Frank
Electrical integrity of state-of-the-art 0.13 μm SOI CMOS devices and circuits transferred for three-dimensional (3D) integrated circuit (IC) fabrication
- K.W. Guarini
- A. Topol
- et al.
- 2002
- IEDM 2002
Conference paperPower-constrained device and technology design for the end of scaling
- David J. Frank
- 2002
- IEDM 2002
Conference paperVoltage dependence of hard breakdown growth and the reliability implication in thin dielectrics
- Barry P. Linder
- Salvatore Lombardo
- et al.
- 2002
- IEEE Electron Device Letters
PaperSupply voltage strategies for minimizing the power of CMOS processors
- Jin Cai
- Yuan Taur
- et al.
- 2002
- VLSI Technology 2002
Conference paperDesign considerations for CMOS near the limits of scaling
- David J. Frank
- Yuan Taur
- 2002
- Solid-State Electronics
PaperPower-constrained CMOS scaling limits
- David J. Frank
- 2002
- IBM J. Res. Dev
PaperTransistor-limited constant voltage stress of gate dielectrics
- B.P. Linder
- D.J. Frank
- et al.
- 2001
- VLSI Technology 2001
Conference paperCalculating the error in long term oxide reliability estimates
- B.P. Linder
- J.H. Stathis
- et al.
- 2001
- IRPS 2001
Conference paperCalculating the error in long term oxide reliability estimates
- B.P. Linder
- J.H. Stathis
- et al.
- 2001
- IRPS 2001
Conference paper