High Performance CMOS Fabricated on Hybrid Substrate with Different Crystal Orientations
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A 90nm dual damascene hybrid (organic / inorganic) low-k - Copper BEOL integration scheme
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Conference paperScalability and biasing strategy for CMOS with active well bias
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Conference paperFabrication of extremely thin silicon on insulator for fully-depleted CMOS applications
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- Thin Solid Films
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