Effective schottky barrier lowering for contact resistivity reduction using silicides as diffusion sources
- Zhen Zhang
- F. Pagette
- et al.
- 2010
- VLSI-TSA 2010
Conference paper
Publications
15 results for J. Silverman
Sharp reduction of contact resistivities by effective schottky barrier lowering with silicides as diffusion sources
- Zhen Zhang
- F. Pagette
- et al.
- 2010
- IEEE Electron Device Letters
PaperDemonstration of highly scaled FinFET SRAM cells with high-Κ/metal gate and investigation of characteristic variability for the 32 nm node and beyond
- H. Kawasaki
- M. Khater
- et al.
- 2008
- IEDM 2008
Conference paperX-ray lithography: overview and outlook
- J. Silverman
- 1998
- CLEO 1998
Conference paperChallenges and progress in x-ray lithography
- Jerome P. Silverman
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperEvaluation of the defense advanced lithography program (DALP) X-ray lithography aligner
- A.C. Chen
- A. Flamholz
- et al.
- 1997
- Microlithography 1997
Conference paperX-ray lithography: Status, challenges, and outlook for 0.13 μm
- Jerome P. Silverman
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperOperating experience with the Helios compact storage ring at IBM
- J. Silverman
- Chas N. Archie
- et al.
- 1994
- Nuclear Inst. and Methods in Physics Research, A
PaperA 0.5 μm fully scaled two-level metal fully planarized interconnect structure fabricated with X-ray lithography
- D. Moy
- L.K. Wang
- et al.
- 1990
- VLSI Technology 1990
Conference paper0.5 μm CMOS devices and circuits fabricated using synchrotron X-ray lithography
- L.K. Wang
- C.H. Hsu
- et al.
- 1989
- VLSI Technology 1989
Conference paper