New Photoacid Generators Designed for Advanced EUV Patterning
- Kamal P. Pandey
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
Conference paper
Publications
97 results for Karen Petrillo
Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithography
- KwangMo Choi
- YunJi Kim
- et al.
- 2025
- SPIE Advanced Lithography 2025
Conference paperThe Impact of Polymer Compositional Homogeneity on Lithography and Defects
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2025
- SPIE Advanced Lithography 2025
Conference paperCommercialization of Non-PFAS KrF and Development of Non-PFAS EUV Photoresists
- Cong Liu
- Joseph Lachowski
- et al.
- 2025
- SPIE Advanced Lithography 2025
Conference paperNew Molecular Resist Design for Advanced Patterning
- Vageesha Liyana Gunawardana
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
Conference paperEffect of Composition Uniformity in the Polymer Chain of EUV Photoresist on Lithographic Performance
- EuiJin Ko
- YooRim Jang
- et al.
- 2025
- SPIE Advanced Lithography 2025
Conference paperAcid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators
- Jayoung Koo
- YunJi Kim
- et al.
- 2024
- SPIE Advanced Lithography 2024
Conference paperNovel spin-on overcoat materials for EUV photoresist enhancement
- Xisen Hou
- Yinjie Cen
- et al.
- 2024
- SPIE Advanced Lithography 2024
Conference paperDisruptive non-fluorinated photoacid generators using computational chemistry and library design
- P. Labeaume
- K. Hernandez
- et al.
- 2024
- SPIE Advanced Lithography 2024
Conference paperAdvanced EUV CAR small molecule compounds design and its impact to etch performance
- Yinjie Cen
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Conference paper