High resolution patterning in chemically amplified resists: The effect of film thickness
- David R. Medeiros
- Wayne M. Moreau
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Paper
Publications
97 results for Karen Petrillo
A high performance E-beam resist coupling excellent dry etch resistance and sub 100nm resolution for advanced mask and device making
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperTunable anti-reflective coatings with built-in hard mask properties facilitating thin resist processing
- Arpan P. Mahorowala
- Katherina Babich
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperRecent progress in electron-beam resists for advanced mask-making
- D. Medeiros
- A. Aviram
- et al.
- 2001
- IBM J. Res. Dev
PaperWhen is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperExtending the performance of KRS-XE for high throughput electron beam lithography for advanced mask making
- David R. Medeiros
- Karen E. Petrillo
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperUse of KRS-XE positive chemically amplified resist for optical mask manufacturing
- Brian Ashe
- Christina Deverich
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
PaperTransfer etching of bilayer resists in oxygen-based plasmas
- A. Mahorowala
- K. Babich
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperHigh resolution 248 nm bilayer resist
- Q. Lin
- K.E. Petrillo
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Conference paperA new family of non-chemically amplified resists
- Ari Aviram
- Marie Angelopoulos
- et al.
- 1998
- Microlithography 1998
Conference paper