Silicides of ruthenium and osmium: Thin film reactions, diffusion, nucleation, and stability
- C.S. Petersson
- J.E.E. Baglin
- et al.
- 1982
- Journal of Applied Physics
Paper
Publications
94 results for J. E.E. Baglin
Epitaxial NiSi2 formation by pulsed ion beam annealing
- L.J. Chen
- L.S. Hung
- et al.
- 1982
- Applied Physics Letters
PaperRadioactive Ni* tracer study of the nickel silicide growth mechanism
- J.E.E. Baglin
- H.A. Atwater
- et al.
- 1982
- Thin Solid Films
PaperPulsed ion beam irradiation of silicon
- W.K. Chu
- S. Mader
- et al.
- 1982
- Nuclear Instruments and Methods
PaperPulsed proton beam annealing: Semiconductors and silicides
- J.E.E. Baglin
- R.T. Hodgson
- et al.
- 1981
- Nuclear Instruments and Methods
PaperDiffusion marker experiments with rare-earth silicides and germanides: Relative mobilities of the two atom species
- J.E.E. Baglin
- F.M. D'Heurle
- et al.
- 1981
- Journal of Applied Physics
PaperAn intense pulsed barium ion source
- J.M. Neri
- D.A. Hammer
- et al.
- 1981
- IEEE TNS
PaperTantalum silicide films deposited by dc sputtering
- J. Angilello
- J.E.E. Baglin
- et al.
- 1981
- Journal of Electronic Materials
PaperGraded-index AR surfaces produced by ion implantation on plastic materials
- E. Spiller
- I. Hailer
- et al.
- 1980
- Applied Optics
PaperAn interface - marker technique applied to the study of metal silicide growth
- J.E.E. Baglin
- F.M. D'Heurle
- et al.
- 1980
- Nuclear Instruments and Methods
Paper