Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar systemK. KehlerJ.W. Coburnet al.1985JVSTAPaper
Summary Abstract: Modification of metals by low energy ions during thin film depositionJ.M.E. HaroerJ.J. Cuomo1985JVSTAPaper
Summary Abstract: Titanium silicide films prepared by reactive sputteringV. DelineF.M. d’Heurle1985JVSTAPaper
Summary Abstract: Microstructure and electrical conductivity of plasma deposited gold/fluorocarbon composite filmsJ. PerrinB. Despaxet al.1985JVSTAPaper