Projection reduction exposure with variable axis immersion lenses: Next generation lithography
- H.C. Pfeiffer
- R.S. Dhaliwal
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Publications
168 results at Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Near-field distribution in light-coupling masks for contact lithography
- Michael Paulus
- Bruno Michel
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperMARS: Femtosecond laser mask advanced repair system in manufacturing
- Richard Haight
- Dennis Hayden
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperDeep-ultraviolet interferometric lithography as a tool for assessment nf chemically amplified photoresist performance
- W.D. Hinsberg
- F.A. Houle
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperChemically amplified resist processing with top coats for deep-ultraviolet and e-beam applications
- Karen Petrillo
- James Bucchignano
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperFabrication of Cu interconnects of 50 nm linewidth by electron-beam lithography and high-density plasma etching
- Y. Hsu
- T. Standaert
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperCurrent oscillations in thin metal-oxide-semiconductor structures observed by ballistic electron emission microscopy
- H.J. Wen
- R. Ludeke
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperFabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator
- R.C. Tiberio
- D.W. Carr
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperDirectional copper deposition using dc magnetron self-sputtering
- Zbigniew J. Radzimski
- Witold M. Posadowski
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
PaperLight-coupling masks: An alternative, lensless approach to high-resolution optical contact lithography
- Heinz Schmid
- Hans Biebuyck
- et al.
- 1998
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper