A Single Expose Double Develop (SEDD) process for self-aligned lithographic applications
- Donis Flagello
- Andrew Pomerene
- 1989
- Microelectronic Engineering
Paper
Publications
14467 results for Physical Sciences
Compensation mechanisms in n+-GaAs doped with sulphur
- R. Venkatasubramanian
- S.K. Ghandhi
- et al.
- 1989
- Journal of Crystal Growth
PaperA comparison of the E-beam sensitivities and relative O2-plasma stabilities of organosilicon polymers.Part III. Lithographic characteristics of poly-1,1,3-trimethyl-1-sila - and poly-1,1,3,3-tetramethyl-1,3- disilacyclobutenes and related silmethylene polymers
- E. Babich
- J. Paraszczak
- et al.
- 1989
- Microelectronic Engineering
PaperMetallurgical topics in silicon device interconnections: Thin film stresses
- F.M. D’Heurle
- 1989
- International Materials Reviews
ReviewTiburon conference on high performance SQUID systems San Francisco, California, USA, 25-27 August 1988
- R.L. Fagaly
- C.D. Tesche
- 1989
- Cryogenics
Conference paperMolecular electronics—science and technology
- Ari Aviram
- 1989
- Advanced Materials
Conference paperMagnetic and magneto‐optic thin films and multilayers in San Diego
- Ernesto Marinerom
- Takao Suzuki
- 1989
- Advanced Materials
Conference paperIn situ measurements of corona poling induced SHG in amorphous polymers
- Manfred Eich
- Ayusman Sen
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperTwo normal incidence collimators designed for the calibration of the extreme ultraviolet explorer
- Sharon R. Jelinsky
- Barry Welsh
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperFocussed excimer laser beams: A technique for selective micropatterning
- Jean M. Hagerhorst
- Modest M. Oprysko
- 1988
- SPIE OE/LASE 1988
Conference paper