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Parameter Dependence of RIE Induced Radiation Damage in Silicon DioxideL.M. EphrarhD.J. Dimariaet al.2019JESPaper
Structural Composition of Polymers Relative to Their Plasma Etch CharacteristicsLester A. Pederson2019JESPaper
Control of Plasma Etch Profiles with Plasma Sheath Electric Field and RF Power DensityR.S. Horwath2019JESPaper
Difluorocarbene Emission Spectra from Fluorocarbon Plasmas and its Relationship to Fluorocarbon Polymer FormationM.M. MillardE. Kay2019JESPaper
Critical angles for channeling of boron ions implanted into single-crystal siliconChanahae ParkKevin M. Kleinet al.2019JESPaper
Computer Simulation of Oxygen Segregation in CZ/MCZ Silicon Crystals and Comparison with Experimental ResultsW.E. Langlois2019JESPaper