Characterization of the polymer-developer interface in 193 nm photoresist polymers and formulations during dissolution
- Thomas Wallow
- Wendy Chan
- et al.
- 2002
- Microlithography 2002
Conference paper
Publications
26911 results for Science
Building high-performance chemically amplified resists with polymer blends
- Qinghuang Lin
- John Simons
- et al.
- 2002
- Microlithography 2002
Conference paperMethods for comparing contact hole shrinking techniques with 248 nm single layer and bilayer photoresists
- Karen Petrillo
- John Simons
- et al.
- 2002
- Microlithography 2002
Conference paperA performance study of robust load sharing strategies for distributed heterogeneous Web server systems
- Michele Colajanni
- Philip S. Yu
- 2002
- IEEE Transactions on Knowledge and Data Engineering
PaperIDMP-based fast handoffs and paging in IP-based 4G mobile networks
- Archan Misra
- Subir Das
- et al.
- 2002
- IEEE Communications Magazine
PaperMultishell conduction in multiwalled carbon nanotubes
- P.G. Collins
- Ph. Avouris
- 2002
- Applied Physics A: Materials Science and Processing
PaperLinear and quadratic algorithms for scheduling chains and opposite chains
- Jacek Blaewicz
- Zhen Liu
- 2002
- EJOR
PaperConfigurable Development Processes
- John Cameron
- 2002
- Communications of the ACM
PaperAn efficient indexing method for nearest neighbor searches in high-dimensional image databases
- Guang-Ho Cha
- Xiaoming Zhu
- et al.
- 2002
- IEEE TMM
PaperMultiple Parameter Continuation: Computing Implicitly Defined k-Manifolds
- Michael E. Henderson
- 2002
- IJBC
Paper