Selectivity in copper chemical vapor deposition
- Susan L. Cohen
- Michael Liehr
- et al.
- 1992
- Applied Physics Letters
Paper
Publications
2351 results at Applied Physics Letters
Si ejection and regrowth during the initial stages of Si(001) oxidation
- David G. Cahill
- Ph. Avouris
- 1992
- Applied Physics Letters
PaperX-ray reflectivity analysis of giant-magnetoresistance spin-valve layered structures
- T.C. Huang
- J.-P. Nozieres
- et al.
- 1992
- Applied Physics Letters
PaperRaman scattering from H or O terminated porous Si
- J.C. Tsang
- M.A. Tischler
- et al.
- 1992
- Applied Physics Letters
PaperHeavy arsenic doping of silicon grown by atmospheric-pressure chemical vapor deposition at low temperatures
- P. Agnello
- T.O. Sedgwick
- et al.
- 1992
- Applied Physics Letters
PaperObservation of the fractional quantum Hall effect in Si/SiGe heterostructures
- S. Nelson
- K. Ismail
- et al.
- 1992
- Applied Physics Letters
PaperScanning probe microscopy of thermal conductivity and subsurface properties
- M. Nonnenmacher
- H.K. Wickramasinghe
- 1992
- Applied Physics Letters
PaperAnomalous diffusion of fluorine in silicon
- S.-P. Jeng
- T.P. Ma
- et al.
- 1992
- Applied Physics Letters
PaperSilicon epitaxy from silane by atmospheric-pressure chemical vapor deposition at low temperatures
- P. Agnello
- T.O. Sedgwick
- et al.
- 1992
- Applied Physics Letters
PaperPrecursors for Si atomic layer epitaxy: Real time adsorption studies on Si(100)
- D.D. Koleske
- S. Gates
- et al.
- 1992
- Applied Physics Letters
Paper