Kinetics of chemically amplified resists
- G.M. Wallraff
- W.D. Hinsberg
- et al.
- 1995
- Microlithography 1995
Conference paper
Publications
25372 results for Science
Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography
- Daniel Bucca
- A. Aviram
- et al.
- 1995
- Microlithography 1995
Conference paper193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
- R.D. Allen
- G.M. Wallraff
- et al.
- 1995
- Microlithography 1995
Conference paperStrains in epitaxial films: The general case
- P.M. Marcus
- F. Jona
- 1995
- Physical Review B
PaperOptical spectroscopy of the metal-insulator transition in NdNiO3
- T. Katsufuji
- Y. Okimoto
- et al.
- 1995
- Physical Review B
PaperInfluence of the carrier distribution on carrier-carrier scattering in GaAs
- J.A. Kash
- 1995
- Physical Review B
PaperDesign, fabrication, and automated testing of 32-channel integrated MSM/MESFET optoelectronic integrated circuit (OEIC) receiver arrays
- D.L. Rogers
- S. Walker
- et al.
- 1995
- SPIE Photonics West 1995
Conference paperOptical interconnect within hermetic packages using holograms
- Kung-Shiuh Huang
- Robert R. Shaw
- 1995
- SPIE Photonics West 1995
Conference paperIntelligent tool for selecting colors and fonts for graphical user interfaces
- Bernice E. Rogowitz
- J.A. Gerth
- et al.
- 1995
- IS&T/SPIE Electronic Imaging 1995
Conference paperOptical data storage requirements on short-wavelength laser sources
- W.J. Kozlovsky
- 1995
- SPIE Photonics West 1995
Conference paper