Resist materials design: Base-catalyzed chemical amplification
- C.G. Wilison
- J.F. Cameron
- et al.
- 1993
- Microlithography 1993
Conference paper
Publications
26903 results for Science
Characterization and simulation of acid catalyzed DUV positive photoresist
- Nicholas K. Eib
- Eytan Barouch
- et al.
- 1993
- Microlithography 1993
Conference paperThe influence of residual casting solvent on the dissolution behavior of diazonaphthoquinone resists
- V. Rao
- W.D. Hinsberg
- et al.
- 1993
- Microlithography 1993
Conference paperNew chemistry in the i)esign of chemically amplified positive resists
- Robert D. Allen
- Quan P. Ly
- et al.
- 1993
- Microlithography 1993
Conference paperComparison of liquid- And vapor-phase silylation processes for 193-nm positive-tone lithography
- Mark A. Hartney
- Roderick R. Kunz
- et al.
- 1993
- Microlithography 1993
Conference paperInfluence of polymer properties on airborne chemical contamination of chemically amplified resists
- W.D. Hinsberg
- Scott A. MacDonald
- et al.
- 1993
- Microlithography 1993
Conference paperFabrication of extremely thin silicon on insulator for fully-depleted CMOS applications
- A. Bindal
- N. Rovedo
- et al.
- 1993
- Thin Solid Films
PaperPorting a calibrated color image across corporate boundaries
- Fred Mintzer
- Ed Pariser
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperData structures and perceptual structures
- Bernice E. Rogowitz
- Lloyd A. Treinish
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paperLossy compression of palettized images
- Yung Chen
- Heidi Peterson
- et al.
- 1993
- IS&T/SPIE Electronic Imaging 1993
Conference paper