Schottky barrier formation at Pd, Pt, and Ni/Si(111) interfacesR.J. PurtellG. Hollingeret al.1983JVSTAPaper
Fine-grained base electrode process for Pb-alloy Josephson technologyA.A. BrightS. Klepner1983JVSTAPaper
Summary Abstract: Preparation of Pb-Bi film by alloy evaporation II. Microstructure and morphologyH.-C.W. HuangC.M. Serrano1983JVSTAPaper
Chemical bonding and Schottky barrier formation at transition metal-silicon interfacesPaul S. Ho1983JVSTAPaper
Importance of chain reactions in the plasma deposition of hydrogenated amorphous siliconIvan Haller1983JVSTAPaper