On the difference of temperature dependence of metal gate and poly gate SOI MOSFET threshold voltagesShu-Jen HanXinlin Wanget al.2008IEDM 2008Conference paper
22 nm technology compatible fully functional 0.1 μm 2 6T-sram cellB. HaranA. Kumaret al.2008IEDM 2008Conference paper
32nm general purpose bulk CMOS technology for high performance applications at low voltageF. ArnaudJ. Liuet al.2008IEDM 2008Conference paper
A statistical study of magnetic tunnel junctions for high-density spin torque transfer-MRAM (STT-MRAM)R. BeachT. Minet al.2008IEDM 2008Conference paper
Improved effective switching current (Ieff+) and capacitance methodology for CMOS circuit performance prediction and model-to-hardware correlationXiaojun YuShu-Jen Hanet al.2008IEDM 2008Conference paper