Oxidation temperature dependence of the dc electrical conduction characteristics and dielectric strength of thin Ta2O5 films on silicon
- G.S. Oehrlein
- 1986
- Journal of Applied Physics
Paper
Publications
2360 results at Journal of Applied Physics
Thermal stability of TiSi2 on mono- and polycrystalline silicon
- C.Y. Wong
- L.K. Wang
- et al.
- 1986
- Journal of Applied Physics
PaperPhase transformations in alloy and bilayer thin films of vanadium and silicon
- F. Nava
- P.A. Psaras
- et al.
- 1986
- Journal of Applied Physics
PaperMorphology and kinetics of crystallization of amorphous V75Si25 thin-alloy films
- F. Nava
- B.Z. Weiss
- et al.
- 1986
- Journal of Applied Physics
PaperResistivity of AuIn2+δ thin films
- A.A. Bright
- J.T. Wetzel
- 1986
- Journal of Applied Physics
PaperOptical ranging by wavelength multiplexed interferometry
- C.C. Williams
- H.K. Wickramasinghe
- 1986
- Journal of Applied Physics
PaperA study of CClF3/H2 reactive ion etching damage and contamination effects in silicon
- X.C. Mu
- S.J. Fonash
- et al.
- 1986
- Journal of Applied Physics
PaperPtSi contact metallurgy: Comparison of different annealing sequences, annealing time and ambients, and deposition techniques of Pt
- Chin-An Chang
- 1986
- Journal of Applied Physics
ReviewFormation of Pt silicides: The effect of oxygen
- Chin-An Chang
- 1985
- Journal of Applied Physics
PaperConsequences of anion vacancy nearest-neighbor hopping in III-V compound semiconductors: Drift in InP metal-insulator-semiconductor field-effect transistors
- J.A. Van Vechten
- J.F. Wager
- 1985
- Journal of Applied Physics
Paper