Laser detection of diatomic products of plasma sputtering and etching
- R.E. Walkup
- Ph. Avouris
- et al.
- 1984
- Applied Physics Letters
Paper
Publications
2351 results at Applied Physics Letters
Diffusion of phosphorus during rapid thermal annealing of ion-implanted silicon
- G.S. Oehrlein
- S. Cohen
- et al.
- 1984
- Applied Physics Letters
PaperStudy of silicon contamination and near-surface damage caused by CF 4/H2 reactive ion etching
- G.S. Oehrlein
- R.M. Tromp
- et al.
- 1984
- Applied Physics Letters
PaperIV curves of long annular Josephson junctions
- A. Davidson
- N.F. Pedersen
- 1984
- Applied Physics Letters
PaperProbing the transition layer at the SiO2-Si interface using core level photoemission
- G. Hollinger
- F.J. Himpsel
- 1984
- Applied Physics Letters
PaperTransient enhanced diffusion in arsenic-implanted short time annealed silicon
- R. Kalish
- T.O. Sedgwick
- et al.
- 1984
- Applied Physics Letters
PaperPhotothermal spectroscopy using a pyroelectric thin-film detector
- H. Coufal
- 1984
- Applied Physics Letters
PaperResonant Fowler-Nordheim tunneling in n-GaAs-undoped Al xGa1-xAs-n+GaAs capacitors
- T.W. Hickmott
- P. Solomon
- et al.
- 1984
- Applied Physics Letters
PaperOptical stethoscopy: Image recording with resolution λ/20
- D. Pohl
- W. Denk
- et al.
- 1984
- Applied Physics Letters
PaperOutdiffusion of Si through gold films: The effects of Si orientation, gold deposition techniques and rates, and annealing ambients
- Chin-An Chang
- G. Ottaviani
- 1984
- Applied Physics Letters
Paper