Reactive Ion Etching of Silicon Nitride Deposited by Different Methods in CF4/H2 PlasmasW.A. Lanford2019JESPaper
Computer simulation of boron transport in magnetic czochralski growth of siliconW.E. Langlois2019JESPaper
Reactive Ion Etching of Sputter Deposited Tantalum Oxide and its Etch Selectivity to TantalumYue Kuo2019JESPaper
Reactive Ion Etching of PECVD n+ a-Si:H: Plasma Damage to PECVD Silicon Nitride Film and Application to Thin Film Transistor PreparationM.S. Crowder2019JESPaper