Importance of chain reactions in the plasma deposition of hydrogenated amorphous silicon
- Ivan Haller
- 1983
- JVSTA
Paper
Publications
3555 results for Materials Discovery
Plasma etching of niobium with CF4/O2 gases
- Mao-Min Chen
- Run Han Wang
- 1983
- JVSTA
PaperAmmonia cluster formation and NH3 decomposition on a Ni(100) surface
- M. Grunze
- P.A. Dowben
- et al.
- 1983
- Surface Science
PaperPatterning of poly-para-xylylenes by reactive ion etching
- J.T.C. Yeh
- K.R. Grebe
- 1983
- JVSTA
PaperA He-diffraction investigation of the p(2×2) and c(2×2) phases of oxygen on Ni(100)
- K.H. Rieder
- 1983
- Surface Science
PaperSummary Abstract: Crystallographic structure of coevaporated Ni-Al alloy films
- H.T.G. Hentzell
- B. Andersson
- et al.
- 1983
- JVSTA
PaperOxygen chemisorption and oxide formation on Si(111) and Si(100) surfaces
- G. Hollinger
- F.J. Himpsel
- 1983
- JVSTA
PaperEffect of surface chemistry and work function in secondary ion mass spectrometry
- Ming L. Yu
- 1983
- JVSTA
PaperSchottky barrier formation at Pd, Pt, and Ni/Si(111) interfaces
- R.J. Purtell
- G. Hollinger
- et al.
- 1983
- JVSTA
PaperChemical bonding and reactions at Ti/Si and Ti/oxygen/Si interfaces
- R. Blitz
- G.W. Rubloff
- et al.
- 1983
- JVSTA
Paper