VLSI Limitations from Drain-Induced Barrier Lowering
- Ronald R. Troutman
- 1979
- IEEE T-ED
Paper
Publications
465 results at IEEE T-ED
1 μm MOSFET VLSI Technology: Part V—A Single-Level Polysilicon Technology Using Electron-Beam Lithography
- William R. Hunter
- Linda Ephrath
- et al.
- 1979
- IEEE T-ED
PaperWA-B2 on the Memory Behavior of Thin-Film Electroluminescent Devices
- P.M. Alt
- W.E. Howard
- et al.
- 1979
- IEEE T-ED
PaperMP-B5 Graded or Stepped Insulator MIS Structures (GI-MIS or SI-MIS)
- D.J. DiMaria
- D.W. Dong
- 1979
- IEEE T-ED
Paper1 µm MOSFET VLSI Technology: Part VII—Metal Silicide Interconnection Technology—A Future Perspective
- Billy L. Crowder
- Stanley Zirinsky
- 1979
- IEEE T-ED
PaperTA-A1 Theory of Nonthermal Pulsed Laser Annealing
- J.A. Van Vechten
- Ellen J. Yoffa
- et al.
- 1979
- IEEE T-ED
PaperElectron-Beam Resist Edge Profile Simulation
- David F. Kyser
- Chiu H. Ting
- 1979
- IEEE T-ED
Paper1 µm MOSFET VLSI Technology: Part 11—Device Designs and Characteristics for High-Performance Logic Applications
- Robert H. Dennard
- Fritz H. Gaensslen
- et al.
- 1979
- IEEE T-ED
Paper1 μm MOSFET VLSI Technology: Part VIIII—Radiation Effects
- John M. Aitken
- 1979
- IEEE T-ED
PaperHot-Electron Emission in N-Channel IGFET's
- Tak H. Ning
- Ronald R. Troutman
- 1979
- IEEE T-ED
Paper