IBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
Conference paper
Publications
14462 results for Physical Sciences
Mesoscale modeling for SFIL simulating polymerization kinetics and densification
- Ryan L. Burns
- Stephen C. Johnson
- et al.
- 2004
- Microlithography 2004
Conference paperLiquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperOptimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperMeasurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Conference paperAssessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperReactive dissolution kinetics of lithographic copolymers
- William Hinsberg
- Frances Houle
- et al.
- 2004
- Microlithography 2004
Conference paperDeep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperRinse additives for line edge roughness control in 193 nm lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2004
- Microlithography 2004
Conference paperCombinatorial resist processing studies
- Carl E. Larson
- Gregory M. Wallraff
- 2004
- Microlithography 2004
Conference paper