Measurements of water distribution in thin lithographic films
- Bryan D. Vogt
- Christopher L. Soles
- et al.
- 2004
- Microlithography 2004
Conference paper
Publications
14467 results for Physical Sciences
Deep-UV immersion interferometric lithography
- Alex K. Raub
- A. Frauenglass
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperRinse additives for line edge roughness control in 193 nm lithography
- Dario L. Goldfarb
- Sean D. Burns
- et al.
- 2004
- Microlithography 2004
Conference paperAssessing the impact of intrinsic birefringence on 157nm lithography
- Nakgeuon Seong
- Kafai Lai
- et al.
- 2004
- SPIE Advanced Lithography 2004
Conference paperLiquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperFundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248 nm and 157 nm photoresists
- Vivek M. Prabhu
- Michael X. Wang
- et al.
- 2004
- Microlithography 2004
Conference paperHigh speed, lateral PIN photodiodes in silicon technologies
- Jeremy D. Schaub
- Steven J. Koester
- et al.
- 2004
- SPIE IOPTO 2004
Conference paperMicro-four-point-probe characterization of nanowires fabricated using the nanostencil technique
- R. Lin
- M. Bammerlin
- et al.
- 2004
- Nanotechnology
PaperAnalyzing the structure of CoFe-Fe 3O 4 core-shell nanoparticles by electron imaging and diffraction
- Jing Li
- Hao Zeng
- et al.
- 2004
- Journal of Physical Chemistry B
PaperSolution-processed inorganic semiconductors
- David B. Mitzi
- 2004
- Journal of Materials Chemistry
Review