Anisotropic etching of a novalak-based polymer at cryogenic temperature
- R. Hsiao
- K. Yu
- et al.
- 1997
- JES
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Publications
14468 results for Physical Sciences
Explanation for the oxide thickness dependence of breakdown characteristics of metal-oxide-semiconductor structures
- D.J. Dimaria
- 1997
- Microelectronic Engineering
PaperA commercially viable 193 nm single layer resist platform
- F.M. Houlihan
- Thomas I. Wallow
- et al.
- 1997
- J. Photopolym. Sci. Tech.
PaperCrosslinked polyimide foams derived from poly(imide-propylene oxide) copolymers
- J.L. Hedrick
- K.R. Carter
- et al.
- 1997
- Macromolecular Chemistry and Physics
Paper"Living" free radical polymerization of macromonomers: Preparation of well defined graft copolymers
- Craig J. Hawker
- David Mecerreyes
- et al.
- 1997
- Macromolecular Chemistry and Physics
PaperReaction of polyaniline with NMP at elevated temperatures
- A. Afzali
- Stephen L. Buchwalter
- et al.
- 1997
- Polymer
PaperThe forgotten liquid crystals of Daniel Vorländer: A new look at mesogenic 4-pyridones
- Daniel J. Dyer
- Victor Y. Lee
- et al.
- 1997
- Liquid Crystals
PaperThe influence of photoacid structure on the design and performance of 193-nm resists
- Robert D. Allen
- Juliann Opitz
- et al.
- 1997
- J. Photopolym. Sci. Tech.
PaperThe effect of Lewis acid catalysis on the decomposition of CF3OCF3 to COF2 and CF4
- J. Pacansky
- R.J. Waltman
- 1997
- Journal of Fluorine Chemistry
PaperEfficient optical activation of ion-implanted Zn acceptors in GaN by annealing under 10 kbar N2 overpressure
- S. Strite
- A. Pelzmann
- et al.
- 1997
- MRS Internet Journal of Nitride Semiconductor Research
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