Dry Etching for VLSI—A Review
- L.M. Ephrath
- 2019
- JES
Paper
Publications
14466 results for Physical Sciences
AZ1350J as a Deep-U.V. Mask Material
- B.J. Lin
- 2019
- JES
PaperThe Dependence of the Memory Effect in ZnS:Mn A-C Thin Film Electroluminescence on Mn Distribution
- V. Marrello
- A.A. Onton
- 2019
- JES
PaperAn Electrochemically Sealed Al2O3 Passivation Layer for Aluminum Alloys
- M.H. Lee
- A. Homola
- 2019
- JES
PaperPlasma Oxide FET Devices
- A. Ray
- A. Reisman
- 2019
- JES
PaperThe Controlled Etching of Silicon in Catalyzed Ethylenediamine-Pyrocatechol-Water Solutions
- A. Reisman
- M. Berkenblit
- et al.
- 2019
- JES
PaperOn the Nature of Fixed Oxide Charge
- S.I. Raider
- A. Berman
- 2019
- JES
PaperEffect of Plating Parameters on Electrodeposition of NiFe
- J. Horkans
- 2019
- JES
PaperInfluence of the Growth Conditions of Al2O3 Passivating Layers on the Corrosion of Aluminum Films in Water
- J. Grimblot
- J.M. Eldridge
- 2019
- JES
PaperOxidation and Corrosion Studies of Fe1-xPdx Films
- Wen-Yaung Lee
- G. Scherer
- et al.
- 2019
- JES
Paper