Silylation of poly (t-BOC) styrene resists: Performance and mechanisms
- C.A. Spence
- S.A. Macdonald
- et al.
- 1990
- Microlithography 1990
Conference paper
Publications
14462 results for Physical Sciences
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
Conference paperA highly etch resistant, negative resist for deep-UV and electron beam lithography
- Dennis R. McKean
- Nicholas J. Clecak
- et al.
- 1990
- Microlithography 1990
Conference paperNegative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990
Conference paperPhotoreflectance study of electric field distributions in semiconductors heterostructures grown on semi-insulating substrates
- H. Shen
- Fred H. Pollak
- et al.
- 1990
- Journal of Electronic Materials
PaperCarbon incorporation in metal-organic vapor phase epitaxy grown gaas from CHxl4-x, HI, and l2
- N.I. Buchan
- T.F. Kuech
- et al.
- 1990
- Journal of Electronic Materials
PaperSuperconducting transport properties of grain boundaries in YBa2Cu3O7 bicrystals
- D. Dimos
- P. Chaudhari
- et al.
- 1990
- Physical Review B
PaperElectron-spectroscopy study of YbXCu4 (X=Ag,Au,Pd)
- J.-S. Kang
- J.W. Allen
- et al.
- 1990
- Physical Review B
PaperExact diagonalization of finite frustrated spin-(1/2 Heisenberg models
- F. Figueirido
- A. Karlhede
- et al.
- 1990
- Physical Review B
PaperAnomalous Raman spectra from La2CuO4
- Gerald Burns
- F.H. Dacol
- 1990
- Physical Review B
Paper