Identification and sensitivity analysis of a correlated ground rule system (design arc)
- Eric Eastman
- Dureseti Chidambarrao
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper
Publications
23 results at SPIE Advanced Lithography 2017
Design intent optimization at the beyond 7nm node: The intersection of DTCO and EUVL stochastic mitigation techniques
- Michael Crouse
- L. Liebmann
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperDecomposition of the TCC using non-coherent kernels for faster calculation of lithographic images
- Alan E. Rosenbluth
- 2017
- SPIE Advanced Lithography 2017
Conference paperOverlay statistics for multiple exposure patterning
- 2017
- SPIE Advanced Lithography 2017
Conference paperReducing line edge roughness in si and sin through plasma etch chemistry optimization for photonic waveguide applications
- Nathan Marchack
- Marwan Khater
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperPrintability and actinic AIMS review of programmed mask blank defects
- Erik Verduijn
- Pawitter Mangat
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperDirected self-assembly patterning strategies for phase change memory applications
- Robert L. Bruce
- Gloria Fraczak
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperMix-and-match considerations for EUV insertion in N7 HVM
- Xuemei Chen
- Allen Gabor
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperSingle-expose patterning development for EUV lithography
- Anuja De Silva
- Karen Petrillo
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paperReaching for the true overlay in advanced nodes
- Chiew-Seng Koay
- Bassem Hamieh
- et al.
- 2017
- SPIE Advanced Lithography 2017
Conference paper