Buckling characterization of gate all around silicon nanowires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paper
Publications
14 results at SPIE Advanced Lithography 2013
CD optimization methodology for extending optical lithography
- C. Wong
- G. Seevaratnam
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperEtch correction and OPC, a look at the current state and future of etch correction
- Ian Stobert
- Derren Dunn
- 2013
- SPIE Advanced Lithography 2013
Conference paperAdvanced plasma etch for the 10nm node and beyond
- 2013
- SPIE Advanced Lithography 2013
Conference paperPattern transfer of directed self-assembly (DSA) patterns for CMOS device applications
- Hsin-Yu Tsai
- Hiroyuki Miyazoe
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperOn the accuracy of different Fourier transforms of VLSI designs
- Rajai Nasser
- Paul Hurley
- 2013
- SPIE Advanced Lithography 2013
Conference paperDirected self-assembly process implementation in a 300mm pilot line environment
- Chi-Chun Liu
- I. Cristina Estrada-Raygoza
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperDeterministically isolated gratings through the directed self-assembly of block copolymers
- Gregory Sadasdf Doerk
- Joy Y. Cheng
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperEnabling reverse tone imaging for via levels using attenuated Phase Shift Mask and source optimization
- Bassem Hamieh
- Hyun Chol Choi
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paperDevelopment of KrF hybrid resist for a dual isolation application
- Sen Liu
- Steven Holmes
- et al.
- 2013
- SPIE Advanced Lithography 2013
Conference paper