Publications

15 results at SPIE Advanced Lithography 2010

Spatial signature in local overlay measurements - "what CD-SEM can tell us and optical measurements can not"
- - Scott Halle
  - Daniel Moore
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
CD-SEM metrology of spike detection on sub-40 nm contact holes
- - Yoshinori Momonoi
  - Taro Osabe
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
3D-AFM enhancement for CD metrology dedicated to lithography sub-28-nm node requirements
- - Johann Foucher
  - Narender Rana
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Resist-based polarization monitoring with phase-shift masks at 1.35 numerical aperture: Tool-to-tool comparison
- - Gregory McIntyre
  - Richard Tu
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Hybrid reference metrology exploiting patterning simulation
- - Narender Rana
  - Chas Archie
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings
- - Alok Vaid
  - Matthew Sendelbach
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Smaller, smarter, faster, and more accurate: The new overlay metrology
- - Nelson M. Felix
  - Allen H. Gabor
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Direct write 3-dimensional nanopatterning using probes
- - David Pires
  - Armin Knoll
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Self-assembling materials for lithographic patterning: Overview, status and moving forward
- - William Hinsberg
  - Joy Cheng
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper
Demonstrating the benefits of source-mask optimization and enabling technologies through experiment and simulations
- - David Melville
  - Alan E. Rosenbluth
  - et al.
- 2010
- SPIE Advanced Lithography 2010
Conference paper