Dario Goldfarb

Publications

• Measuring Contact Hole Distributions for Use in Predicting Missing Contact Hole Rates

  • • Elisa Novelli
    • Chris A. Mack
    • et al.
  • 2026
  • SPIE Advanced Lithography + Patterning 2026

  Conference paper

• IBM Lithography Roadmap: Need for Future Lithography Tools and Masks and Requirements for Resists to Avoid Stochastic Defects

  • • Allen Gabor
    • Martin Burkhardt
    • et al.
  • 2026
  • SPIE Advanced Lithography + Patterning 2026

  Conference paper

• Metal-Oxide Resist Develop Method Down-Select and Process Optimization

  • • Nicholas Latham
    • Belle Antonovich
    • et al.
  • 2026
  • SPIE Advanced Lithography + Patterning 2026

  Conference paper

• Mitigating X‑ray–Induced Damage in CD‑SAXS Metrology of EUV Resists

  • • Philipp Wieser
    • Kevin Yager
    • et al.
  • 2026
  • SPIE Advanced Lithography + Patterning 2026

  Conference paper

• Exploring the Limits of Contact Hole Patterning with High NA EUV Lithography

  • • Dario Goldfarb
    • Zheng Chen
    • et al.
  • 2026
  • SPIE Advanced Lithography + Patterning 2026

  Talk

• IBM Lithography Roadmap and Need for Future Lithography Tools

  • • Allen Gabor
    • Martin Burkhardt
    • et al.
  • 2025
  • EUVL and Source Workshop 2025

  Keynote

• Dry heterometallic resist processing based on thermal sublimation deposition and development

  • • Dario Goldfarb
    • Scott Lewis
    • et al.
  • 2022
  • JM3

  Paper