P. Alnot, D.J. Auerbach, et al.
Surface Science
Paper
Acid-base reactions in a positive tone chemically amplified photoresist and their effect on imaging
Abstract
No abstract available.
Related
J.A. Barker, D. Henderson, et al.
Molecular Physics
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials