Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
A method to fabricate nano-scale Cu bond pads for improving bonding quality in 3D integration applications is reported. The effect of Cu bonding quality on inter-level via structural reliability for 3D integration applications is investigated. We developed a Cu nano-scale-height bond pad structure and fabrication process for improved bonding quality by recessing oxides using a combination of SiO2 CMP process and dilute HF wet etching. In addition, in order to achieve improved waferlevel bonding, we introduced a seal design concept that prevents corrosion and provides extra mechanical support. Demonstrations of these concepts and processes provide the feasibility of reliable nano-scale 3D integration applications. Copyright © 2011 American Scientific Publishers.
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
Sung Ho Kim, Oun-Ho Park, et al.
Small
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Kenneth R. Carter, Robert D. Miller, et al.
Macromolecules