Yichen Xu, Baoqi Zhu, et al.
VLSI Technology and Circuits 2026
In this work, we present and review a physics-based statistical model recently developed for our experimental findings of the reverse BD area scaling using hydrogen-plasma-treated HfO2 ReRAM devices, demonstrating no fundamental reason preventing the old scaling law from being reversed or altered, thus providing a solution for ReRAM technology scaling.
Yichen Xu, Baoqi Zhu, et al.
VLSI Technology and Circuits 2026
Lin Dong, Steven Hung, et al.
VLSI Technology 2021
Akihiro Horibe, Yoichi Taira, et al.
IEDM 2025
Pritish Parida
DCD Connect NY 2025