Lithography and fabrication processes for sub-100 nm scale complementary metal-oxide semiconductor
- S.J. Wind
- Y. Taur
- et al.
- 1995
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Paper
Publications
29 results for R. Viswanathan
Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography
- R. Viswanathan
- David Seeger
- et al.
- 1994
- Microelectronic Engineering
PaperHigh-accuracy defect-free X-Ray mask technology
- Steven C. Nash
- Thomas B. Faure
- et al.
- 1994
- Japanese Journal of Applied Physics
Paper0.5 μm CMOS devices and circuits fabricated using synchrotron X-ray lithography
- L.K. Wang
- C.H. Hsu
- et al.
- 1989
- VLSI Technology 1989
Conference paperFully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization
- R. Viswanathan
- R.E. Acosta
- et al.
- 1989
- Microelectronic Engineering
PaperElectrical resistivity and radiation damage in boro-hydro-nitride x-ray lithography mask substrates
- S.S. Dana
- J. Batey
- et al.
- 1987
- Microelectronic Engineering
PaperDistortion of masks for x-ray lithography
- R.E. Acosta
- J.R. Maldonado
- et al.
- 1985
- Microelectronic Engineering
PaperElectron beam fabrication and characterization of fresnel zone plates for soft x-ray microscopy
- D. Kern
- P. Coane
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paperElectron beam pattern writer for x-ray masks
- R. Viswanathan
- A.D. Wilson
- et al.
- 1989
- Proceedings of SPIE 1989
Conference paper