Positive resists based on non-polymeric macromolecules
- Ratnam Sooriyakumaran
- Hoa Truong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
Paper
Publications
41 results for Linda K. Sundberg
Fluoroalcohol-methacrylate resists for 193nm lithography
- P.R. Varanasi
- R.W. Kwong
- et al.
- 2005
- J. Photopolym. Sci. Tech.
PaperDesign of protective topcoats for immersion lithography
- Robert D. Allen
- Phillip J. Brock
- et al.
- 2005
- J. Photopolym. Sci. Tech.
PaperSub-50 nm half-pitch imaging with a low activation energy chemically amplified photoresist
- G.M. Wallraff
- D. Medeiros
- et al.
- 2004
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Conference paperTemplating organosilicate vitrification using unimolecular self-organizing polymers prepared from tandem ring opening and atom transfer radical polymerizations
- T. Magbitang
- V.Y. Lee
- et al.
- 2004
- Macromolecular Symposia
Conference paperOptimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paper193-nm negative resist based on acid-catalyzed elimination of polar molecules
- R. Sooriyakumaran
- B. Davis
- et al.
- 2004
- Microlithography 2004
Conference paperLiquid immersion lithography - Evaluation of resist issues
- William Hinsberg
- Gregory Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperPorous organosilicates low-dielectric films for high-frequency devices
- André Knoesen
- Ge Song
- et al.
- 2004
- Journal of Electronic Materials
PaperTemplating of silsesquioxane cross-linking using unimolecular self-organizing polymers
- Eric F. Connor
- Linda K. Sundberg
- et al.
- 2003
- Angewandte Chemie - International Edition
Paper