Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Publications
4 results for Elisa Novelli
Measuring Contact Hole Distributions for Use in Predicting Missing Contact Hole Rates
- Elisa Novelli
- Chris A. Mack
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperDose reduction strategies for low-n PSM absorber using pupil and mask bias optimization at 0.33NA EUV lithography
- Rajiv Sejpal
- Gopal Kenath
- et al.
- 2025
- Photomask Japan 2025
Conference paperPredicting and Measuring Scummed Contact Holes
- Elisa Novelli
- Chris A. Mack
- et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Conference paper