Characterization and mechanism of He plasma pretreatment of nanoscale polymer masks for improved pattern transfer fidelity
- Florian Weilnboeck
- D. Metzler
- et al.
- 2011
- Applied Physics Letters
Paper
Publications
99 results for Robert L. Bruce
A 0.021 μm2 trigate SRAM cell with aggressively scaled gate and contact pitch
- Michael A. Guillorn
- Josephine Chang
- et al.
- 2011
- VLSI Technology 2011
Conference paperPost Porosity Plasma Protection a new approach to integrate k 2.2 porous ULK materials
- Theo Frot
- Willi Volksen
- et al.
- 2011
- IITC/MAM 2011
Conference paperOn the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists
- R. Bruce
- Florian Weilnboeck
- et al.
- 2011
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
PaperApplication of the protection/deprotection strategy to the science of porous materials
- Theo Frot
- Willi Volksen
- et al.
- 2011
- Advanced Materials
PaperMetallization opportunities and challenges for future back-end-of-the-line technology
- Cyril Cabral Jr.
- Benjamin Fletcher
- et al.
- 2010
- ADMETA 2010
Conference paperMolecular structure effects on dry etching behavior of Si-containing resists in oxygen plasma
- R. Bruce
- T. Lin
- et al.
- 2010
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
PaperDependence of polymer surface roughening rate on deposited energy density during plasma processing
- Sebastian Engelmann
- Robert L. Bruce
- et al.
- 2009
- Plasma Processes and Polymers
PaperDependence of photoresist surface modifications during plasma-based pattern transfer on choice of feedgas composition: Comparison of C4 F 8 - And CF4 -based discharges
- S. Engelmann
- R. Bruce
- et al.
- 2009
- Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Paper