IBM-JSR 193nm negative tone resist: Polymer design, material properties, and lithographic performance
- Kaushal Patel
- Margaret Lawson
- et al.
- 2004
- Microlithography 2004
Conference paper
Publications
101 results for Gregory M. Wallraff
Optimized acid release underlayers for 157 nm lithography
- Carl E. Larson
- G.M. Wallraff
- et al.
- 2004
- Microlithography 2004
Conference paperPatterned nanoporous poly(methylsilsesquioxane) thin films: A potential high density substrate
- Zach L. Hogan
- Cortney R. Kreller
- et al.
- 2004
- Materials Science and Engineering C
PaperPhotopatterned nanoporous media
- Ho-Cheol Kim
- Gregory Wallraff
- et al.
- 2004
- Nano Letters
PaperImpact of thin resist processes on post-etch LER
- Arpan P. Mahorowala
- Dario L. Goldfarb
- et al.
- 2003
- Microlithography 2003
Conference paperExtendibility of chemically amplified amplified resists: Another brick wall?
- William Hinsberg
- Frances Houle
- et al.
- 2003
- Microlithography 2003
Conference paperStable and efficient fluorescent red and green dyes for external and internal conversion of blue OLED emission
- Sally A. Swanson
- Greg M. Wallraff
- et al.
- 2003
- Chemistry of Materials
PaperConformational Transition Studies of Organosilane Polymers by Light and Neutron Scattering
- Premal Shukla
- Patricia M. Cotts
- et al.
- 2002
- Macromolecules
PaperSpectroscopic Characterization of Piezochromism in Poly(Alkylsilanes): Poly(di-o-hexylsilane)
- K. Song
- H. Kuzmany
- et al.
- 2002
- Macromolecules
PaperStudies of Chain Conformational Kinetics in Poly(di-n-alkylsilanes) by Spectroscopic Methods. 4. Piezochromism in Symmetrical Poly(di-n-alkylsilanes)
- Kigook Song
- Robert D. Miller
- et al.
- 2002
- Macromolecules
Paper