Porosity in plasma enhanced chemical vapor deposited SiCoH dielectrics: A comparative study
- A. Grill
- V.V. Patel
- et al.
- 2003
- Journal of Applied Physics
Paper
Publications
126 results for Ken Rodbell
Positron annihilation techniques suited for porosity characterization of thin films
- M.P. Petkov
- C.L. Wang
- et al.
- 2003
- Journal of Physical Chemistry B
PaperSingle-event upsets in microelectronics: Fundamental physics and issues
- Henry H.K. Tang
- Kenneth P. Rodbell
- 2003
- MRS Bulletin
PaperSeveral issues regarding the nanopore structure in low-dielectric-constant films detected by positron annihilation lifetime spectroscopy
- C.L. Wang
- M.H. Weber
- et al.
- 2003
- Radiation Physics and Chemistry
Conference paperRadiation effects in low dielectric constant methyl-silsesquioxane films
- Mihail P. Petkov
- Kelvin G. Lynn
- et al.
- 2002
- IEEE TNS
Conference paperNanometer-scale pores in low-k dielectric films probed by positron annihilation lifetime spectroscopy
- C.L. Wang
- M.H. Weber
- et al.
- 2002
- Applied Physics Letters
PaperA comparison of grain size measurements in Al-Cu thin films: Imaging verses diffraction techniques
- Lynne Gignac
- C.E. Murray
- et al.
- 2002
- Microscopy and Microanalysis
PaperCrystallographic texture and phase metrology during damascene copper processing
- K.J. Kozaczek
- P. DeHaven
- et al.
- 2002
- MRS Proceedings 2002
Conference paperCharacteristics of low-k and ultralow-k PECVD deposited SiCOH films
- A. Grill
- V.V. Patel
- et al.
- 2002
- MRS Proceedings 2002
Conference paperPorosity characterization by beam-based three-photon positron annihilation spectroscopy
- Mihail P. Petkov
- Marc H. Weber
- et al.
- 2001
- Applied Physics Letters
Paper