Lithographic performance of an EL-3 system at 0.25μm groundrules
- T. Newman
- M.G.R. Thomson
- et al.
- 1991
- Microelectronic Engineering
Paper
Publications
221 results at Microelectronic Engineering
Conducting polyaniline: Removable SEM discharge layer
- Marie Angelopoulos
- Jane M. Shaw
- et al.
- 1991
- Microelectronic Engineering
PaperAcid hardenable, spin-coatable silicon ladder polymer systems as resist materials
- Hiroyuki Hiraoka
- Tsuguo Yamaoka
- 1991
- Microelectronic Engineering
PaperComparison of vapor and liquid phase silylation processes of photoresists
- E. Babich
- J. Paraszczak
- et al.
- 1991
- Microelectronic Engineering
PaperDevice design issues for a high-performance technology with Si or SiGe epitaxial base
- J.N. Burghartz
- J.D. Cressler
- et al.
- 1991
- Microelectronic Engineering
PaperA simple bilayer lift-off process
- David F. Witman
- Jane M. Shaw
- et al.
- 1990
- Microelectronic Engineering
PaperThermoelastic effects on x-ray lithography masks under pulsed irradiation
- Iqbal Shareef
- Juan R. Maldonado
- et al.
- 1990
- Microelectronic Engineering
PaperSilylation of resist materials using di- and polyfunctional organosilicon compounds
- E. Babich
- J. Paraszczak
- et al.
- 1990
- Microelectronic Engineering
PaperCW and time resolved luminescence study of dry etch damage in semiconductor wires
- B.E. Maile
- G. Mayer
- et al.
- 1990
- Microelectronic Engineering
PaperDry ridge etching of AlGaAs GRINSCH lasers
- M. Jost
- P. Buchmann
- et al.
- 1990
- Microelectronic Engineering
Paper