The electron beam proximity printing lithography, a candidate for the 0.35 and 0.25 micron chip generations
- U. Behringer
- W. Haug
- et al.
- 1991
- Microelectronic Engineering
Paper
Publications
24861 results for Exploratory Science
Trace-driven study of CMS file references
- G.P. Bozman
- H.H. Ghannad
- et al.
- 1991
- IBM J. Res. Dev
PaperIon-beam sputtered diamond-like carbon with densities of 2.9 g/cc
- Jerome J. Cuomo
- John Bruley
- et al.
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
PaperComparison of vapor and liquid phase silylation processes of photoresists
- E. Babich
- J. Paraszczak
- et al.
- 1991
- Microelectronic Engineering
PaperPhotogenerated amines and their use in the design of a positive-tone resist material based on electrophilic aromatic substitution
- Stephen Matuszczak
- James F. Cameron
- et al.
- 1991
- Journal of Materials Chemistry
ReviewTheory of Schottky barrier and metallization
- I.P. Batra
- E. Tekman
- et al.
- 1991
- Progress in Surface Science
ReviewAspects in the progression of materials and processes for 256Mb-DRAM and beyond
- Will Conley
- 1991
- SPIE Tutorial Texts in Optical Engineering 1991
Conference paperPhotoresist technology for 0.25 μm lithography
- Will Conley
- 1991
- Single Frequency Semiconductor Lasers 1991
Conference paperMicroscopic view of scanning tunneling microscopy
- Julian Chen
- 1991
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Conference paperResponse to "Comments on the paper 'Coupling capacitances in VLSI Circuits calculated by multi-dimensional discrete fourier-series'"
- F.S. Lai
- 1991
- Solid State Electronics
Paper