Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Publications
13 results at SPIE Advanced Lithography + Patterning 2026
IBM Lithography Roadmap: Shorter‑Wavelength Lithography, Resist and Mask Requirements to Reduce Stochastic Defects
- Allen Gabor
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperExploring the Limits of Contact Hole Patterning with High NA EUV Lithography
- Dario Goldfarb
- Zheng Chen
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Talk