Evaluation of In-line SIMS Impact on Device Reliability and Performance
- Jander Cruz
- Li Xiang
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Publications
10 results at SPIE Advanced Lithography + Patterning 2026
Mitigating X‑ray–Induced Damage in CD‑SAXS Metrology of EUV Resists
- Philipp Wieser
- Kevin Yager
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperIBM Lithography Roadmap: Need for Future Lithography Tools and Masks and Requirements for Resists to Avoid Stochastic Defects
- Allen Gabor
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperIn-line XPS metrology for area selective deposition processes on patterned structures
- Manasa Medikonda
- Linda Wangoh
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperScaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- Gopal Kenath
- Martin Burkhardt
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperLithographic Process Optimization for Next-Generation Advanced Packaging Influenced by Wafer Topography and Reticle Stitching
- Chris Bottoms
- Sarah Nahar Chowdhury
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperMetal-Oxide Resist Develop Method Down-Select and Process Optimization
- Nicholas Latham
- Belle Antonovich
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperMeasuring Contact Hole Distributions for Use in Predicting Missing Contact Hole Rates
- Elisa Novelli
- Chris A. Mack
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperEvaluation of High NA EUV for Subtractive Interconnect Patterning in Advanced Nodes
- Chris Penny
- Joe Lee
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paperExploring the Limits of Contact Hole Patterning with High NA EUV Lithography
- Dario Goldfarb
- Zheng Chen
- et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Talk