Allen Gabor

Title

Distinguished Engineer

Bio

Allen Gabor is a Senior Technical Staff Member at IBM. He has worked in the field of lithography at Arch Chemicals, GlobalFoundries and IBM. This work has included photoresist development, CD control, overlay minimization and 193 dry, immersion and EUV insertion. He received his PhD (1996) in Materials Science and Engineering from Cornell University based on his work on block copolymer photoresists. He is the author of more than 50 journal papers and holder of over 30 patents. He currently serves on the program committee for SPIE Extreme Ultraviolet (EUV) Lithography Conference and is a senior member of SPIE.

Publications

IBM Lithography Roadmap: Need for Future Lithography Tools and Masks and Requirements for Resists to Avoid Stochastic Defects
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization
- - Gopal Kenath
  - Martin Burkhardt
  - et al.
- 2026
- SPIE Advanced Lithography + Patterning 2026
Conference paper
IBM Lithography Roadmap and Need for Future Lithography Tools
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2025
- EUVL and Source Workshop 2025
Keynote
Wet clean oxidation for optimal line width and LER
- - Steven McDermott
  - Keith Donegan
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
Conference paper
Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulations
- - Romain Lallement
  - Daniel Schmidt
  - et al.
- 2023
- OEN 2023
Conference paper
Bayesian dropout approximation in deep learning neural networks: Analysis of self-Aligned quadruple patterning
- - Scott D. Halle
  - Derren N. Dunn
  - et al.
- 2022
- JM3
Paper
Predicting overlay mark performance based on process emulation and optical simulation
- - Sagarika Mukesh
  - Jack Wong
  - et al.
- 2022
- SPIE Advanced Lithography 2022
Conference paper
EUV single exposure via patterning at aggressive pitch
- - Jing Guo
  - Jennifer Church
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paper
Effect of high NA "half-field" printing on overlay error
- - Allen Gabor
  - Martin Burkhardt
  - et al.
- 2021
- SPIE Advanced Lithography 2021
Conference paper
Bayesian dropout approximation in deep learning neural networks: Analysis of self-aligned quadruple patterning
- - Scott D. Halle
  - Max O. Bloomfield
  - et al.
- 2020
- SPIE Advanced Lithography 2020
Conference paper

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Allen Gabor

Title

Bio

Publications

IBM Lithography Roadmap: Need for Future Lithography Tools and Masks and Requirements for Resists to Avoid Stochastic Defects

Scaling Single Expose EUV Gate LER Through Source-Resist-Mask Co-optimization

IBM Lithography Roadmap and Need for Future Lithography Tools

Wet clean oxidation for optimal line width and LER

Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulations

Bayesian dropout approximation in deep learning neural networks: Analysis of self-Aligned quadruple patterning

Predicting overlay mark performance based on process emulation and optical simulation

EUV single exposure via patterning at aggressive pitch

Effect of high NA "half-field" printing on overlay error

Bayesian dropout approximation in deep learning neural networks: Analysis of self-aligned quadruple patterning

Patents

Process Of Making A Semiconductor Device Using Multiple Antireflective Materials

Multiple Exposure Lithography Method Incorporating Intermediate Layer Patterning

Methods For Forming A Composite Pattern Including Printed Resolution Assist Features

Composite Structures To Prevent Pattern Collapse

Polyconductor Line End Formation And Related Mask

Methods For Reducing Within Chip Device Parameter Variations

Method And Algorithm For The Control Of Critical Dimensions In A Thermal Flow Process

Process Of Making A Semiconductor Device Using Multiple Antireflective Materials

Mask Design For Enhancing Line End Resolution

Polyconductor Line End Formation And Related Mask

Top collaborators

Luciana Meli

Jed Rankin

Dario Goldfarb

Nelson Felix