Ernest Y Wu, Takashi Ando, et al.
IEDM 2023
We demonstrate 25% efficiency improvement in double spin-torque magnetic tunnel junctions (DS-MTJs) compared to standard single-MTJs, without degrading other properties. Optimized stacks enabled reliable setting of the two reference layers into the desired anti-parallel alignment for a 4-kbit DS-MTJ array, where switching of all 4k devices with 2 ns write pulses was demonstrated for the first time. Activation energy ~ 60 kT at CD ~ 40 nm was achieved with new free layer designs. Devices with optimized DS-MTJ free layers also exhibit steep write-error-rate (WER) slopes, comparable to those of the best single-MTJs reported to date.
Ernest Y Wu, Takashi Ando, et al.
IEDM 2023
Yichen Xu, Baoqi Zhu, et al.
VLSI Technology and Circuits 2026
Lin Dong, Steven Hung, et al.
VLSI Technology 2021
Akihiro Horibe, Yoichi Taira, et al.
IEDM 2025